radio frequency magnetron sputtering method 射频磁控溅射法
Radio-frequency magnetron sputtering 用射频磁控溅射法 ; 磁控溅射
Radio-Frequency magnetron sputtering system 控溅渡系统
reactive radio-frequency magnetron sputtering 反应磁控溅射
reactive radio frequency magnetron sputtering 反应射频磁控溅射
radio frequency magnetron co-sputtering 射频磁控复合溅射
The films deposited by radio frequency magnetron sputtering were inclined to phase separation.
说明采用射频磁控溅射方法得到的薄膜倾向于相分离。
参考来源 - BThe Mg_(0.1)Zn_(0.9)O:Al films prepared by radio frequency magnetron sputtering on glass substrates were polycrystalline with hexagonal wurtzite structure and had a preferred orientation (002) with the c-axis perpendicular to the substrates. The diffraction angle 2θ was about 34.6°.
采用射频磁控溅射法在玻璃衬底上制备出的Mg_(0.1)Zn_(0.9)O∶Al薄膜为多晶膜，具有六角纤锌矿结构和(002)方向的择优取向，衍射角2θ位于34.6°附近。
参考来源 - MgZnO：Al透明导电膜的制备与特性研究·2,447,543篇论文数据，部分数据来源于NoteExpress
The influence of rotation speed and pendulum amplitude on the thickness uniformity of film deposited by radio frequency magnetron sputtering system with rotation and pendulum was researched.
研究了基片摆动和基片自转的磁控溅射系统中基片摆动角振幅和基片自转角速度对磁控溅射膜厚均匀性的影响。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
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